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Morphological and stoichiometric optimization of Cu2O thin films by deposition conditions and post-growth annealing

Umar, Medina and Swinkels, Milo Y. and De Luca, Marta and Fasolato, Claudia and Moser, Lucas and Gadea, Gerard and Marot, Laurent and Glatzel, Thilo and Zardo, Ilaria. (2021) Morphological and stoichiometric optimization of Cu2O thin films by deposition conditions and post-growth annealing. Thin Solid Films, 732. ARTN 138763.

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Official URL: https://edoc.unibas.ch/86793/

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Faculties and Departments:05 Faculty of Science > Departement Physik > Physik > Nanomechanik (Meyer)
UniBasel Contributors:Glatzel, Thilo and Zardo, Ilaria
Item Type:Article, refereed
Article Subtype:Research Article
Publisher:Elsevier
ISSN:0040-6090
Note:Publication type according to Uni Basel Research Database: Journal article
Language:English
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Last Modified:25 Mar 2022 13:23
Deposited On:25 Mar 2022 13:23

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