Fabrication and Characterization of Silicon Oxynitride Thin Films

Matinzadeh, Ziba and Salem, Mohammad Kazem and Abbasi, Hamed and Faryadras, Sanaz. (2013) Fabrication and Characterization of Silicon Oxynitride Thin Films. In: 19th Iranian conference on optics and photonics (ICOP). pp. 1-4.

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In this paper we report fabrication and characterization of silicon oxynitride thin films. Thin films have been deposited by means of DC magnetron sputtering system, by use of pure silicon 99.99%. All of the deposition parameters were constant except value of oxygen (as the active gas) and argon (as the inert gas). Four samples have been deposited with different values of gases. Finding a relation between the value of used gases and thin films properties has been investigated. Spectrophotometry and atomic force microscopy have been used to do so.
Faculties and Departments:03 Faculty of Medicine > Departement Biomedical Engineering > Laser and Robotics > Biomedical Laser and Optics (Zam)
UniBasel Contributors:Abbasi, Hamed
Item Type:Conference or Workshop Item, refereed
Conference or workshop item Subtype:Conference Paper
Publisher:Optics and Photonics Society of Iran (OPSI)
Note:Publication type according to Uni Basel Research Database: Conference paper
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Last Modified:30 Dec 2020 15:34
Deposited On:30 Dec 2020 15:29

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