Knopfmacher, O. and Tarasov, A. and Wangyang, Fu and Wipf, M. and Niesen, B. and Calame, M. and Schönenberger, C.. (2010) The Nernst limit in dual-gated Si nanowire FET sensors. Nano Letters, Vol. 10, H. 6. pp. 2268-2274.
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Official URL: http://edoc.unibas.ch/dok/A5841637
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| Faculties and Departments: | 05 Faculty of Science > Departement Physik > Physik > Experimentalphysik Nanoelektronik (Schönenberger) |
|---|---|
| UniBasel Contributors: | Schönenberger, Christian and Knopfmacher, Oren and Tarasov, Alexey and Fu, Wangyang and Wipf, Mathias and Calame, Michel |
| Item Type: | Article, refereed |
| Article Subtype: | Research Article |
| Publisher: | American Chemical Society |
| ISSN: | 1530-6984 |
| e-ISSN: | 1530-6992 |
| Note: | Publication type according to Uni Basel Research Database: Journal article |
| Last Modified: | 13 Oct 2017 07:32 |
| Deposited On: | 14 Sep 2012 06:47 |
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