Marot, L. and Straboni, A. and Drouet, M.. (2001) A New Thermally Assisted, Plasma Based, Ionic Implantation System of Treatment and Deposition. Surface and Coatings Technology, 142-144. pp. 384-387.
Full text not available from this repository.
Official URL: https://edoc.unibas.ch/95034/
Downloads: Statistics Overview
Abstract
Plasma based ionic implantation (PBII) is a new alternative to conventional ion implantation to produce near-surface treatments, layer growth or semiconductor doping, with the advantage of being non-directional. Furthermore, it can be used for improving the corrosion, friction and wear resisting properties of materials. This paper describes the development of a thermally assisted plasma immersion implantation reactor (TAPIIR). The system aimed at treating samples in the 0.5-60 keV range, with temperature regulation up to 1000°C. Thermochemical treatments, like the nitriding of steels or aluminium, are studied with a separate implantation and diffusion parameter control.
| Faculties and Departments: | 05 Faculty of Science > Departement Physik > Physik > Nanomechanik (Meyer) |
|---|---|
| UniBasel Contributors: | Marot, Laurent |
| Item Type: | Article, refereed |
| Article Subtype: | Research Article |
| Publisher: | Elsevier |
| ISSN: | 0257-8972 |
| e-ISSN: | 1879-3347 |
| Note: | Publication type according to Uni Basel Research Database: Journal article |
| Identification Number: | |
| Last Modified: | 26 Jun 2023 07:10 |
| Deposited On: | 26 Jun 2023 07:10 |
Repository Staff Only: item control page
