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High-yield fabrication of nm-sized gaps in monolayer CVD graphene

Date Issued
2014-01-01
Author(s)
Nef, C.  
Pósa, L.
Makk, P.  
Fu, W.  
Halbritter, A.
Schönenberger, C.  
Calame, M.  
DOI
10.1039/c4nr01838a
Abstract
Herein we demonstrate the controlled and reproducible fabrication of sub-5 nm wide gaps in single-layer graphene electrodes. The process is implemented for graphene grown via chemical vapor deposition using an electroburning process at room temperature and in vacuum. A yield of over 95 percent for the gap formation is obtained. This approach allows producing single-layer graphene electrodes for molecular electronics at a large scale. Additionally, from Raman spectroscopy and electroburning carried out simultaneously, we can follow the heating process and infer the temperature at which the gap formation happens.
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