Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure

Zhang, Yu and Haitjema, Jarich and Baljozovic, Milos and Vockenhuber, Michaela and Kazazis, Dimitrios and Jung, Thomas A. and Ekinci, Yasin and Brouwer, Albert M.. (2018) Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure. Journal of Photopolymer Science and Technology, 31 (2). pp. 249-255.

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We report on the dual-tone property of the tin-oxo cage (BuSn)(12)O-14(OH)(6)]OH)(2) photoresist. After exposing the resist film to a low dose extreme ultraviolet radiation or electron beam, applying a post exposure bake step and development with isopropanol/H2O(2:1), a positive tone image is observed. The previously observed negative tone is found at higher doses. Atomic force microscopy and scanning electron microscopy were used to characterize the topography of the patterns. X-ray photoelectron spectroscopy was used to elucidate the chemical changes of the tin-oxo cages under different conditions. The photoresist, which has dual-tone property, paves the way to fabricate sophisticated structures in a single photoresist layer or may lead to metal-containing resists with improved sensitivity.
Faculties and Departments:05 Faculty of Science > Departement Physik > Physik
UniBasel Contributors:Jung, Thomas A.
Item Type:Article, refereed
Article Subtype:Research Article
Publisher:The Society of Photopolymer Science and Technology (SPST)
Note:Publication type according to Uni Basel Research Database: Journal article
Identification Number:
Last Modified:24 May 2023 08:11
Deposited On:24 May 2023 08:11

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