Nanostructured substrates for high density protein arrays

Zoller, F. A. and Padeste, C. and Ekinci, Y. and Solak, H. H. and Engel, A.. (2008) Nanostructured substrates for high density protein arrays. Microelectronic engineering, Vol. 85. pp. 1370-1374.

Full text not available from this repository.

Official URL: http://edoc.unibas.ch/dok/A5262447

Downloads: Statistics Overview


Nearly defect-free arrays of several 10⁴ gold dots of 12 ± 3 nm in diameter inside 10 nm deep cavities were fabricated for immobilization of proteins. Extreme ultraviolet interference lithography (EUV-IL) at the XIL-beamline of the Swiss Light Source was used to produce 140 nm period arrays of 50 nm holes in a 40 nm thick PMMA layer on oxidized silicon wafers. The size of the openings was reduced by glancing angle deposition (GLAD) of metals such as chromium and silver. Reactive ion etching of the underlying substrate, followed by deposition of a few nanometers of gold, lift-off and thermal annealing resulted in perfectly ordered arrays of small gold nanoparticles with well-defined size distribution. The combination of passivation of the silica surface with polyethylene glycol (PEG) derivatives and functionalization of gold with thiols enables the preparation of large area arrays of well separated functional protein molecules.
Faculties and Departments:05 Faculty of Science > Departement Biozentrum > Former Organization Units Biozentrum > Structural Biology (Engel)
UniBasel Contributors:Engel, Andreas H
Item Type:Article, refereed
Article Subtype:Research Article
Note:Publication type according to Uni Basel Research Database: Journal article
Last Modified:22 Mar 2012 14:24
Deposited On:22 Mar 2012 13:39

Repository Staff Only: item control page