Cold and intense OH radical beam sources

Ploenes, Ludger and Haas, Dominik and Zhang, Dongdong and van de Meerakker, Sebastiaan Y. T. and Willitsch, Stefan. (2016) Cold and intense OH radical beam sources. Review of Scientific Instruments, 87 (5). 053305.

PDF - Published Version

Official URL: http://edoc.unibas.ch/53274/

Downloads: Statistics Overview


We present the design and performance of two supersonic radical beam sources: a conventional pinhole-discharge source and a dielectric barrier discharge (DBD) source, both based on the Nijmegen pulsed valve. Both designs have been characterized by discharging water molecules seeded in the rare gases Ar, Kr, or Xe. The resulting OH radicals have been detected by laser-induced fluorescence. The measured OH densities are (3.0 ± 0.6) × 10(11) cm(-3) and (1.0 ± 0.5) × 10(11) cm(-3) for the pinhole-discharge and DBD sources, respectively. The beam profiles for both radical sources show a relative longitudinal velocity spread of about 10%. The absolute rotational ground state population of the OH beam generated from the pinhole-discharge source has been determined to be more than 98%. The DBD source even produces a rotationally colder OH beam with a population of the ground state exceeding 99%. For the DBD source, addition of O2 molecules to the gas mixture increases the OH beam density by a factor of about 2.5, improves the DBD valve stability, and allows to tune the mean velocity of the radical beam.
Faculties and Departments:05 Faculty of Science > Departement Chemie > Chemie > Chemische Physik (Willitsch)
UniBasel Contributors:Willitsch, Stefan
Item Type:Article, refereed
Article Subtype:Research Article
Publisher:AIP Publishing
Note:Publication type according to Uni Basel Research Database: Journal article -- The final publication is available at AIP Publishing, see DOI link.
Identification Number:
edoc DOI:
Last Modified:09 Oct 2017 07:47
Deposited On:27 Feb 2017 13:49

Repository Staff Only: item control page