Permanent reduction of dissipation in nanomechanical Si resonators by chemical surface protection

Tao, Ye and Navaretti, Paolo and Hauert, R. and Grob, Urs and Poggio, Martino and Degen, Christian. (2015) Permanent reduction of dissipation in nanomechanical Si resonators by chemical surface protection. Nanotechnology, 26 (46). p. 465501.

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We report on mechanical dissipation measurements carried out on thin (∼100 nm), single-crystal silicon cantilevers with varying chemical surface termination. We find that the 1-2 nm-thick native oxide layer of silicon contributes about 85% to the friction of the mechanical resonance. We show that the mechanical friction is proportional to the thickness of the oxide layer and that it crucially depends on oxide formation conditions. We further demonstrate that chemical surface protection by nitridation, liquid-phase hydrosilylation, or gas-phase hydrosilylation can inhibit rapid oxide formation in air and results in a permanent improvement of the mechanical quality factor between three- and five-fold. This improvement extends to cryogenic temperatures. Presented recipes can be directly integrated with standard cleanroom processes and may be especially beneficial for ultrasensitive nanomechanical force- and mass sensors, including silicon cantilevers, membranes, or nanowires.
Faculties and Departments:05 Faculty of Science > Departement Physik > Physik > Nanotechnologie Argovia (Poggio)
UniBasel Contributors:Poggio, Martino
Item Type:Article, refereed
Article Subtype:Research Article
Publisher:IOP Publishing
Note:Publication type according to Uni Basel Research Database: Journal article
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Last Modified:03 Aug 2018 15:09
Deposited On:02 May 2016 12:44

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