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High-yield fabrication of nm-sized gaps in monolayer CVD graphene

Nef, C. and Pósa, L. and Makk, P. and Fu, W. and Halbritter, A. and Schönenberger, C. and Calame, M.. (2014) High-yield fabrication of nm-sized gaps in monolayer CVD graphene. Nanoscale, Vol. 6, H. 13. pp. 7249-7254.

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Official URL: http://edoc.unibas.ch/dok/A6338963

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Abstract

Herein we demonstrate the controlled and reproducible fabrication of sub-5 nm wide gaps in single-layer graphene electrodes. The process is implemented for graphene grown via chemical vapor deposition using an electroburning process at room temperature and in vacuum. A yield of over 95 percent for the gap formation is obtained. This approach allows producing single-layer graphene electrodes for molecular electronics at a large scale. Additionally, from Raman spectroscopy and electroburning carried out simultaneously, we can follow the heating process and infer the temperature at which the gap formation happens.
Faculties and Departments:05 Faculty of Science > Departement Physik > Physik > Experimentalphysik Nanoelektronik (Schönenberger)
UniBasel Contributors:Schönenberger, Christian and Nef, Cornelia and Makk, Peter and Fu, Wangyang and Calame, Michel
Item Type:Article, refereed
Article Subtype:Research Article
Publisher:Royal Society of Chemistry
ISSN:2040-3364
e-ISSN:2040-3372
Note:Publication type according to Uni Basel Research Database: Journal article
Language:English
Identification Number:
Last Modified:14 Jul 2020 08:49
Deposited On:06 Feb 2015 09:59

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