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Hydrogen plasma microlithography of graphene supported on a Si/SiO2 substrate

Baran Eren, and Thilo Glatzel, and Marcin Kisiel, and Wangyang Fu, and Rémy Pawlak, and Urs Gysin, and Cornelia Nef, and Laurent Marot, and Michel Calame, and Christian Schönenberger, and Ernst Meyer, . (2013) Hydrogen plasma microlithography of graphene supported on a Si/SiO2 substrate. Applied physics letters, Vol. 102, H. 7 , 071602.

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Official URL: http://edoc.unibas.ch/dok/A6212027

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Abstract

In this work, a silicon stencil mask with a periodic pattern is used for hydrogen plasma microlithography of single layer graphene supported on a Si/SiO2 substrate. Obtained patterns are imaged with Raman microscopy and Kelvin probe force microscopy, thanks to the changes in the vibrational modes and the contact potential difference (CPD) of graphene after treatment. A decrease of 60 meV in CPD as well as a significant change of the D/G ratio in the Raman spectra can be associated with a local hydrogenation of graphene, while the topography remains invariant to the plasma exposure
Faculties and Departments:05 Faculty of Science > Departement Physik > Physik > Nanomechanik (Meyer)
05 Faculty of Science > Departement Physik > Physik > Experimentalphysik Nanoelektronik (Schönenberger)
UniBasel Contributors:Eren, Baran and Glatzel, Thilo and Kisiel, Marcin and Fu, Wangyang and Nef, Cornelia and Gysin, Urs and Pawlak, Rémy and Marot, Laurent and Calame, Michel and Schönenberger, Christian and Meyer, Ernst
Item Type:Article, refereed
Article Subtype:Research Article
Bibsysno:Link to catalogue
Publisher:American Institute of Physics
ISSN:0003-6951
Note:Publication type according to Uni Basel Research Database: Journal article
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Last Modified:27 Mar 2014 13:12
Deposited On:31 Jan 2014 09:49

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