Characterization of magnetron sputtered rhodium films for reflective coatings

Marot, L. and De Temmerman, G. and Thommen, V. and Mathys, D. and Oelhafen, P.. (2008) Characterization of magnetron sputtered rhodium films for reflective coatings. Surface & coatings technology, Vol. 202, H. 13. pp. 2837-2843.

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Official URL: http://edoc.unibas.ch/dok/A5838813

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Preparation and detailed characterization of metallic rhodium films prepared by magnetron sputtering on silicon substrates have been carried out. Different deposition conditions such as gas pressure, deposition rate and substrate temperature were investigated. The films were characterized by XPS, SEM, XRD, AFM and reflectivity measurements. No impurities were detected on the surface after deposition. The films have a low roughness and their structure exhibit nanometric crystallites with a dense columnar structure. Amongst all investigated parameters, only the gas pressure during deposition was observed to have an influence on the optical properties of the film. Otherwise, the measured reflectivity is close to the reflectivity calculated from optical constants of pure rhodium films. (C) 2007 Elsevier B.V. All rights reserved.
Faculties and Departments:05 Faculty of Science > Departement Physik > Physik > Nanomechanik (Meyer)
UniBasel Contributors:Marot, Laurent
Item Type:Article, refereed
Article Subtype:Research Article
Note:Publication type according to Uni Basel Research Database: Journal article
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Last Modified:14 Sep 2012 07:18
Deposited On:14 Sep 2012 06:45

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