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Surface potential studies using Kelvin force spectroscopy

Lu, J. and Guggisberg, M. and Luthi, R. and Kubon, M. and Scandella, L. and Gerber, C. and Meyer, E. and Guntherodt, H. J.. (1998) Surface potential studies using Kelvin force spectroscopy. Applied physics. A, Materials science & processing, Vol. 66, Part 1 Suppl. S , S273-S275.

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Official URL: http://edoc.unibas.ch/dok/A5839458

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Abstract

A home-built Kelvin force microscope combined with a spectroscopic method is dedicated to local measurements of topography and contact potential differences (CPD). This technique is based on a simple modification of a noncontact atomic force microscopy (nc-AFM), where a bias voltage is applied between the sample and tip during the CPD measurement. The changes in CPD between the tip and various sample materials have been measured. Kelvin force spectra of Pd/Si and of self-assembling monolayer films (SAMs) are presented.
Faculties and Departments:05 Faculty of Science > Departement Physik > Physik > Nanomechanik (Meyer)
UniBasel Contributors:Meyer, Ernst
Item Type:Article, refereed
Article Subtype:Research Article
Bibsysno:Link to catalogue
Publisher:Springer-Verlag
ISSN:1432-0630
Note:Publication type according to Uni Basel Research Database: Journal article
Identification Number:
Last Modified:14 Sep 2012 07:18
Deposited On:14 Sep 2012 06:45

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