Ultrahigh vacuum atomic force microscopy : true atomic resolution

Luthi, R. and Meyer, E. and Bammerlin, M. and Baratoff, A. and Howald, L. and Gerber, C. and Guntherodt, H. J.. (1997) Ultrahigh vacuum atomic force microscopy : true atomic resolution. Surface review and letters, Vol. 4, H. 5. pp. 1025-1029.

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Official URL: http://edoc.unibas.ch/dok/A5839465

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In this note we report the first observation of salient features of the Si(111)(7 x 7) reconstructed surface across monatomic steps by dynamic atomic force microscopy (AFM) in ultrahigh vacuum (UHV). Simultaneous measurements of the resonance frequency shift Delta f of the Si cantilever and of the mean tunneling current (I) over bar(t) from the cleaned Si tip indicate a restricted range for stable imaging with true atomic resolution. The corresponding characteristics vs. distance reveal why feedback control via Delta f is problematic, whereas it is as successful as in conventional STM via (I) over bar(t). Furthermore, local dissipation (energy loss of 10(-14) W) through individual atoms is observed and explained by the coupling of the surface atoms to phonons.
Faculties and Departments:05 Faculty of Science > Departement Physik > Physik > Nanomechanik (Meyer)
UniBasel Contributors:Meyer, Ernst
Item Type:Article, refereed
Article Subtype:Research Article
Publisher:World Scient. Publ.
Note:Publication type according to Uni Basel Research Database: Journal article
Identification Number:
Last Modified:14 Sep 2012 07:18
Deposited On:14 Sep 2012 06:43

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