High aspect ratio constructive nanolithography with a photo-fimerizable molecule

Barczewski, Matthias and Walheim, Stefan and Heiler, Tobias and Błaszczyk, Alfred and Mayor, Marcel and Schimmel, Thomas. (2010) High aspect ratio constructive nanolithography with a photo-fimerizable molecule. Langmuir, 26 (5). pp. 3623-3628.

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Official URL: http://edoc.unibas.ch/dok/A5265354

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A major challenge in constructive nanolithography is the preservation of the lateral resolution of a monolayer-thick template pattern while amplifying it to a structure with a thickness above 10 nm. So far, the most successful approach to achieve this is surface-initiated polymerization (SIP) from e-beam structured monolayer templates in a multistep process. However, spreading of the polymer on the substrate leads to a rapid line-widening. Therefore, structures with lateral resolutions well below 100 nm and thicknesses above 10 nm (aspect ratio: 0.1) were not reported yet. Our approach of photoinduced, constructive, reversible nanolithography, is based on nanografting within a coumarin-derivative thiol (CDT) solution using the tip of an atomic force microscope (AFM). By photodimerization and the formation of disulfide bonds, the CDT polymerizes in a single-step process. We demonstrate the highest lateral resolution in constructive nanolithography at thicknesses above 10 nm (40 nm lateral resolution at 12 nm thickness, aspect ratio: 0.3).
Faculties and Departments:05 Faculty of Science > Departement Chemie > Chemie > Molecular Devices and Materials (Mayor)
UniBasel Contributors:Mayor, Marcel
Item Type:Article, refereed
Article Subtype:Research Article
Publisher:American Chemical Society
Note:Publication type according to Uni Basel Research Database: Journal article
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Last Modified:05 Apr 2017 13:18
Deposited On:22 Mar 2012 14:06

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