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Distance dependence of force and dissipation in non-contact atomic force microscopy on Cu(100) and Al(111)

Pfeiffer, O. and Nony, L. and Bennewitz, R. and Baratoff, A. and Meyer, E.. (2004) Distance dependence of force and dissipation in non-contact atomic force microscopy on Cu(100) and Al(111). Nanotechnology, Vol. 15, H. 2, Sp. Iss. SI , S101-S107.

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Official URL: http://edoc.unibas.ch/dok/A5262124

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Abstract

The dynamic characteristics of a tip oscillating in the nc-AFM mode in close vicinity to a Cu(100)-surface are investigated by means of phase variation experiments in the constant amplitude mode. The change of the quality factor upon approaching the surface deduced from both frequency shift and excitation versus phase curves yield to consistent values. The optimum phase is found to be independent of distance. The dependence of the quality factor on distance is related to `true` damping, because artefacts related to phase misadjustment can be excluded. The experimental results, as well as on-resonance measurements at different bias voltages on an Al(111) surface, are compared to Joule dissipation and to a model of dissipation in which long-range forces lead to viscoelastic deformations.
Faculties and Departments:05 Faculty of Science > Departement Physik > Physik > Nanomechanik (Meyer)
UniBasel Contributors:Meyer, Ernst
Item Type:Article, refereed
Article Subtype:Research Article
Bibsysno:Link to catalogue
Publisher:IOP Publ.
ISSN:0957-4484
Note:Publication type according to Uni Basel Research Database: Journal article
Identification Number:
Last Modified:22 Mar 2012 14:27
Deposited On:22 Mar 2012 13:58

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